TOKYO ELECTRON LIMITED 气相沉积炉 ALPHA-303L-K

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库存状态：现货

东京电子的 ALPHA - 303L - K 气相沉积炉，通过气态化合物在衬底表面发生化学反应，沉积生成薄膜1。主要应用于半导体制造，能制备多种薄膜，为芯片制造等工艺提供关键的薄膜沉积环节。

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