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库存状态:现货
日立国际电气(HITACHI KOKUSAI ELECTRIC INC)的 DJ-1226V-DF 扩散炉是一款垂直低压化学气相沉积(LPCVD)设备,专为 300mm 晶圆设计,支持多晶硅(D-Poly)等材料的高精度薄膜沉积13。其模块化设计可实现高温工艺的精确控制,适用于逻辑芯片、存储器件(如 3D NAND)及功率半导体(SiC/GaN)的量产810。设备通过智能气体流量管理与温度均匀性优化,可显著提升制程良率与可靠性,尤其在成熟制程和先进封装领域表现突出。
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