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东京电子反应腔 TEX-061 用于半导体制造工艺。其功能是为刻蚀、沉积等工艺提供精确可控的反应环境,通过精确控制气体流量、压力和温度等参数,实现高质量的薄膜沉积和精细的刻蚀,以制造先进的半导体器件。
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