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400-0305-668
库存状态:现货
TOKYO ELECTRON LIMITED ALPHA - 303i - K 扩散炉可精确控制温度、气体流量等参数,能实现高温扩散、氧化、退火等工艺。应用于半导体制造领域,用于晶圆的杂质扩散、薄膜生长等,以制造高性能的集成电路器件。
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